Ambient lithographic method using organoborane amine complexes
US8679585B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Aug 3, 2006 |
| Grant date | Mar 25, 2014 |
| Priority date | — |
| Expiry date | Mar 11, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K85/631
- WIPO fieldTextile and paper machines
- WIPO sectorMechanical engineering
Abstract
A pattern is formed and developed on a surface with an ink system comprising (i) a free radical polymerizable monomer, oligomer or polymer, (ii) an organoborane amine complex, (iii) an amine reactive compound, and (iv) oxygen. Components (i)-(iv) are distributed between an ink and a developing medium. The ink formed on the surface in a pattern is developed by exposure of the ink to the developing medium. Component (iv) may be present as naturally occurring in the air. The method has the advantage of developing polymeric and polymer composite patterns rapidly in ambient air, without heating or irradiation. The ink system can be applied to inorganic and organic surfaces, and is particularly useful for polymeric surfaces such as low energy plastics. The composition can be applied to inorganic and organic surfaces, and is particularly useful for polymeric surfaces such as low energy plastics.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.