Forming a bridging feature using chromeless phase-shift lithography
US8685597B2 · kind B2 · utility
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8References
17Claims
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Key dates
| Filing date | Oct 7, 2011 |
| Grant date | Apr 1, 2014 |
| Priority date | — |
| Expiry date | Feb 11, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24802
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
First and second anchor features are formed on a photolithography mask, each having a respective center point. An elongated, chromeless, bridging feature is formed between the anchor features. The bridging feature is offset from the center points of the anchor feature to minimize distortions of a corresponding photoresist feature formed by the bridging feature.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.