Patent · US Active

Photoacid generators and lithographic resists comprising the same

US8685616B2 · kind B2 · utility

6Cited by
34References
5Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJun 10, 2009
Grant dateApr 1, 2014
Priority date—
Expiry dateDec 16, 2029

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10S430/123
  • WIPO fieldOrganic fine chemistry
  • WIPO sectorChemistry

Abstract

The present invention provides photoacid generators for use in chemically amplified resists and lithographic processes using the same.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.