Patent · US Active

Method of manufacturing light emitting diode and light emitting diode manufactured thereby

US8685772B2 · kind B2 · utility

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13Claims
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Key dates

Filing dateJan 5, 2012
Grant dateApr 1, 2014
Priority date
Expiry dateJan 5, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH10H20/825

Abstract

There is provided a method of manufacturing a light emitting diode and a light emitting diode manufactured by the same. The method includes growing a first conductivity type nitride semiconductor layer and an undoped nitride semiconductor layer on a substrate sequentially in a first reaction chamber; transferring the substrate having the first conductivity type nitride semiconductor layer and the undoped nitride semiconductor layer grown thereon to a second reaction chamber; growing an additional first conductivity type nitride semiconductor layer on the undoped nitride semiconductor layer in the second reaction chamber; growing an active layer on the additional first conductivity type nitride semiconductor layer; and growing a second conductivity type nitride semiconductor layer on the active layer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.