Patent · US Active

Low irritancy cleansing compositions

US8685906B2 · kind B2 · utility

1Cited by

0References

9Claims

0Family size

Assignee

INNOSPEC LIMITED · GB

Inventor

Philip Cotrell · Edison, US

Key dates

Filing date	Aug 2, 2010
Grant date	Apr 1, 2014
Priority date	—
Expiry date	Aug 2, 2030

Classification

Technology area (CPC A)Human Necessities
CPC primaryA61Q19/10
WIPO fieldPharmaceuticals
WIPO sectorChemistry

Abstract

Composition A low irritancy cleansing composition comprises: (a) an anionic surfactant compound of formula (I): wherein R1 represents a C4-36 substituted or unsubstituted hydrocarbyl group; each of R2, R3, R4 and R5 independently represents a hydrogen atom or a C1-4 alkyl group and wherein at least one of R2, R3, R4 and R5 is not hydrogen and M+ represents a cation; (b) an amphoteric surfactant; and (c) an alkoxylated non-ionic species; wherein the molar ratio of component (a) to component (b) is from 0.5:1 to 2:1 and wherein the ratio of the mass of component (c) to the combined mass of components (a) and (b) is less than 1.2:1.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.