Patent · US Active

Method and device for measuring motion error of linear stage

US8687200B2 · kind B2 · utility

1Cited by
1References
12Claims
0Family size

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Key dates

Filing dateMay 24, 2012
Grant dateApr 1, 2014
Priority date
Expiry dateOct 2, 2032

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01B2290/70
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

Measurement of motion errors of a linear stage is performed to enable accurate measurement of motion errors in linear directions and a rotational direction in the linear stage using a diffraction grating. A first beam splitter splits a laser beam emitted from a light emitting unit. A first measurement unit measures a unidirectional linear motion error of the linear stage using one laser beam component split by the first beam splitter and a second measurement unit measures an angular motion error and another unidirectional linear motion of the linear stage error using a diffracted beam component obtained by diffracting another laser beam component split by the first beam splitter through the diffraction grating. A third measurement unit circularly polarizes the beam component diffracted through the diffraction grating to measure a third unidirectional linear motion error of the linear stage.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.