Advanced process control system and method utilizing virtual metrology with reliance index
US8688256B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jul 29, 2011 |
| Grant date | Apr 1, 2014 |
| Priority date | — |
| Expiry date | Jul 24, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02P90/02
- WIPO fieldControl
- WIPO sectorInstruments
Abstract
An advanced process control (APC) system, an APC method, and a computer program product, which, when executed, performs an APC method are provided for incorporating virtual metrology (VM) into APC. The present inventions uses a reliance index (RI) and a global similarity index (GSI) to adjust at least one controller gain of a run-to-run (R2R) controller when the VM value of a workpiece is adopted to replace the actual measurement value of the workpiece. The RI is used for gauging the reliability of the VM value, and the GSI is used for assessing the degree of similarity between the set of process data for generating the VM value and all the sets of historical process data used for building the conjecturing model.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.