Patent · US Active

Silane-based compounds and photosensitive resin composition comprising the same

US8691492B2 · kind B2 · utility

0Cited by
1References
18Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 3, 2012
Grant dateApr 8, 2014
Priority date
Expiry dateSep 20, 2032

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC08L2312/06
  • WIPO fieldOptics
  • WIPO sectorInstruments

Abstract

The present application relates to a new silane-based compound, a photosensitive resin composition including the same, and a photosensitive material including the same. The photosensitive resin composition including the silane-based compound according to the exemplary embodiment of the present application increases adhesion strength to a substrate, such that a developing property is excellent and there are no surface stains or defects during a subsequent process. Accordingly, a photosensitive material, a color filter and the like having excellent quality may be manufactured by using the photosensitive resin composition according to the exemplary embodiment of the present application.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.