Method and apparatus for imaging of features on a substrate
US8692876B2 · kind B2 · utility
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14Claims
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Key dates
| Filing date | Jul 8, 2009 |
| Grant date | Apr 8, 2014 |
| Priority date | — |
| Expiry date | Sep 26, 2030 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T2207/30072
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A method for imaging features on a substrate, comprising scanning the substrate and producing an image thereof, overlaying a grid model on the image, fitting the grid model to the locations of at least some of the features on the image, and extracting images of the features.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.