Device and method for generating a barrier discharge in a gas flow

US8696996B2 · kind B2 · utility

Assignee

• Reinhausen Plasma GmbH · DE

Inventors

• Andreas Albrecht · Pirk, DE
• Eckart Theophile · Wenzenbach, DE

Key dates

• Filing date: Mar 1, 2013
• Grant date: Apr 15, 2014
• Expiry date: Mar 1, 2033

Classification

• Technology area (CPC H): Electricity
• CPC primary: H05H2245/15
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

The invention relates to a device and method for generating a barrier discharge in a gas flow, comprising a reactor chamber permeable by the gas from an inflow side to an outflow side, a first electrode, a dielectric that shields the reactor chamber against the first electrode, and a second electrode, wherein the second and the first electrode can be switched to connect to a voltage source. To briefly expose a greater portion, preferably all, of the gas flow through the reactor chamber to a plasma, at least two discharge elements associated with the first electrode and made of electrically conductive material protrude at least partially into the reactor chamber and are electrically insulated from each other and the first and second electrodes, and the second electrode is disposed relative to the discharge elements such that discharges occur between the discharge elements and the second electrode in the reactor chamber.