Diffraction unlimited photolithography
US8697346B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 1, 2011 |
| Grant date | Apr 15, 2014 |
| Priority date | — |
| Expiry date | Jan 2, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02B5/32
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods, devices, systems, and materials are disclosed for diffraction unlimited photofabrication. A method is provided where a photoresponsive material is illuminated with a first optical pattern at a first wavelength of light. The first wavelength of light alters a solubility of the photoresponsive organic material. The photoresponsive material is also illuminated with a second optical pattern at a second wavelength of light. The second wavelength of light hinders the ability of the first wavelength of light to alter the solubility of the photoresponsive organic material where the second optical pattern overlaps the first optical pattern. The photoresponsive organic material is then developed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.