Method for determining number of layers of two-dimensional thin film atomic structure and device for determining number of layers of two-dimensional thin film atomic structure
US8698077B2 · kind B2 · utility
2Cited by
2References
14Claims
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Key dates
| Filing date | Jun 22, 2011 |
| Grant date | Apr 15, 2014 |
| Priority date | — |
| Expiry date | Jun 22, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2223/633
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Provided is a versatile method of determining the number of layers of a two-dimensional atomic layer thin film as compared with conventional methods. An electron beam is radiated to a two-dimensional thin film atomic structure having an unknown number of layers to determine the number of layers based on an intensity of reflected electrons or secondary electrons generated thereby. In particular, this method is effective for determining the number of layers of graphene.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.