Objective lens with deflector plates immersed in electrostatic lens field
US8698093B1 · kind B1 · utility
99Cited by
21References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Mar 12, 2007 |
| Grant date | Apr 15, 2014 |
| Priority date | — |
| Expiry date | Apr 21, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/1516
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
One embodiment relates to an objective lens utilizing magnetic and electrostatic fields which is configured to focus a primary electron beam onto a surface of a target substrate. The objective lens includes a magnetic pole piece and an electrostatic deflector configured within the pole piece. An electrostatic lens field is determined by the pole piece and the electrostatic deflector, and the electrostatic lens field is configured by adjusting offset voltages applied to plates of the electrostatic deflector. Other embodiments, aspects and features are also disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.