Patent · US Active

Ion beam measurement system and method

US8698108B1 · kind B1 · utility

0Cited by

2References

18Claims

0Family size

Assignee

Varian Semiconductor Equipment Associates, Inc. · US

Inventors

Joseph P. Dzengeleski · Newton, US
Eric D. Hermanson · Tewksbury, US
Robert J. Mitchell · Winchester, US
Tyler Rockwell · Wakefield, US
James W. Wilkinson · Topsfield, US
James P. Buonodono · Amesbury, US
Frank Sinclair · Quincy, US

Key dates

Filing date	Mar 8, 2013
Grant date	Apr 15, 2014
Priority date	—
Expiry date	Mar 8, 2033

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/24535
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

A system of measuring ion beam current in a process chamber using conductive liners is disclosed. A conductive liner is used to shield the walls of the process chamber. An ion measuring device, such as an ammeter, is used to measure the current created by the ions that impact the conductive liner. In some embodiments, a mechanism to contain secondary electrons generated in the process chamber is employed. Additionally, the ions that impact the scan system or workpiece may also be measured, thereby allowing the current of the entire ion beam to be measured.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.