Pulsed electron source, power supply method for pulsed electron source and method for controlling a pulsed electron source
US8698402B2 · kind B2 · utility
0Cited by
8References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jan 8, 2009 |
| Grant date | Apr 15, 2014 |
| Priority date | — |
| Expiry date | Mar 10, 2031 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/0959
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The invention relates to a pumped electron source (1) that includes an ionization chamber (4), an acceleration chamber (2) with an electrode (3) for extracting and accelerating primary ions and forming a secondary-electron beam, characterized in that the pumped electron source (1) includes a power supply (11) adapted for applying to the electrode (3) a positive voltage for urging a primary plasma (17) outside the acceleration chamber (2), and a negative voltage pulse for extracting and accelerating the primary ions and forming a secondary-electron beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.