Composite cutter substrate to mitigate residual stress
US8702825B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 9, 2011 |
| Grant date | Apr 22, 2014 |
| Priority date | — |
| Expiry date | Mar 23, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB22F2005/001
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of forming a cutting element that includes filling at least one non-planar region on an upper surface of a carbide substrate with a diamond mixture, subjecting the substrate and the diamond mixture to high pressure high temperature sintering conditions to form a reduced-CTE substrate having polycrystalline diamond that extends a depth into the reduced-CTE substrate in an interface region, and an upper surface made of a composite surface of diamond and carbide, and attaching a polycrystalline diamond body to the composite surface of the reduced-CTE substrate is disclosed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.