Method of manufacturing of a semi-conductor element and semi-conductor element
US8703587B2 · kind B2 · utility
1Cited by
1References
6Claims
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Key dates
| Filing date | Jul 13, 2012 |
| Grant date | Apr 22, 2014 |
| Priority date | — |
| Expiry date | Aug 6, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10H20/821
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing of a semi-conductor element, comprising the following steps: providing a substrate, the substrate having a surface, the surface being partially coated with a coating and having at least one uncoated area, and growing a truncated pyramid of gallium nitride on the uncoated area, wherein the method comprises the following step: growing at least one gallium nitride column on the truncated pyramid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.