Inverse kinematic melting for posing models
US8704828B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 23, 2008 |
| Grant date | Apr 22, 2014 |
| Priority date | — |
| Expiry date | Sep 27, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06T13/40
- WIPO fieldComputer technology
- WIPO sectorElectrical engineering
Abstract
A model is associated with a deep pose. When the model is changed from an attractor pose to a current pose, the current pose and the attractor pose are compared with the deep pose. If any portion of the current pose is more similar to the deep pose than the attractor pose, then the attractor pose is updated. A portion of the attractor pose may be set to the corresponding portion of the current pose. The attractor pose may be modified by a function. Pose attributes of each pose degrees of freedom for the attractor pose, the current pose, and the deep pose may be evaluated to potentially modify all or a portion of the attractor pose. The attractor pose and pose constraints are used to determine a pose of the model, for example by an optimization process based on the attractor pose while satisfying pose constraints.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.