Distributed feedback laser having enhanced etch stop features
US8705582B2 · kind B2 · utility
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2References
5Claims
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Key dates
| Filing date | Jul 1, 2013 |
| Grant date | Apr 22, 2014 |
| Priority date | — |
| Expiry date | Jul 1, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S5/34306
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
In one example embodiment, a DFB laser includes a substrate; an active region positioned above the substrate; a grating layer positioned above the active region, the grating layer including a portion that serves as a primary etch stop layer; a secondary etch stop layer positioned above the grating layer; and a spacer layer interposed between the grating layer and the secondary etch stop layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.