Automatic misalignment balancing scheme for multi-patterning technology
US8709684B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 31, 2012 |
| Grant date | Apr 29, 2014 |
| Priority date | — |
| Expiry date | Jul 31, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG06F30/394
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Some aspects of the present disclosure provide for a method of automatically balancing mask misalignment for multiple patterning layers to minimize the consequences of mask misalignment. In some embodiments, the method defines a routing grid for one or more double patterning layers within an IC layout. The routing grid has a plurality of vertical grid lines extending along a first direction and a plurality of horizontal grid lines extending along a second, orthogonal direction. Alternating lines of the routing grid in a given direction (e.g., the horizontal and vertical direction) are assigned different colors. Shapes on the double patterning layers are then routed along the routing grid in a manner that alternates between different colored grid lines. By routing in such a manner, variations in capacitive coupling caused by mask misalignment are reduced.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.