Methods for forming patterned structures

US8709703B2 · kind B2 · utility

Assignee

• POLARIZATION SOLUTIONS, LLC · US

Inventors

• Xuegong Deng · Piscataway, US
• Jian Jim Wang · Orefield, US
• Lei Chen · Chengdu, CN
• Anguel Nikolov · Bound Brook, US
• Nada O'Brien · Santa Rosa, US
• Xiaoming Liu · Schenectady, US

Key dates

• Filing date: Mar 21, 2008
• Grant date: Apr 29, 2014
• Expiry date: Jan 4, 2032

Classification

• Technology area (CPC G): Physics
• CPC primary: G02B5/1857
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

In general, in a first aspect, the invention features a method that includes forming a first layer comprising a first material over a surface of a second layer, wherein forming the first layer includes sequentially forming a plurality of monolayers of the second material over the surface of the second layer, the second layer comprises a plurality of rows of a second material extending along a first direction and spaced from one another in a second direction orthogonal to the first direction, and the first layer conforms to the surface of the second layer. The method further includes removing portions of the first layer to produce a plurality of rows of the first material extending along the first direction and spaced from one another in the second direction and removing portions of a third layer comprising a third material, where the portions correspond to intervals between the second plurality of rows so that removing the portions forms a plurality of rows of the third material extending along the first direction and spaced apart from one another. The first and second materials are different.