Patent · US Active

Blended block copolymer composition

US8710150B2 · kind B2 · utility

4Cited by

1References

10Claims

0Family size

Assignee

Rohm and Haas Electronic Materials LLC · US

Inventors

Shih-Wei Chang
Valeriy V. Ginzburg · Midland, US
Erin B. Vogel · Midland, US
Daniel J. Murray · Midland, US
Peter Trefonas, III · Medway, US
Phillip D. Hustad · Manvel, US

Key dates

Filing date	Feb 10, 2012
Grant date	Apr 29, 2014
Priority date	—
Expiry date	Nov 16, 2032

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC08L2205/025
WIPO fieldMacromolecular chemistry, polymers
WIPO sectorChemistry

Abstract

A block copolymer composition containing a diblock copolymer blend including a first poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer; and, a second poly(methyl methacrylate)-b-poly((trimethylsilyl)methyl methacrylate) diblock copolymer. Also provided are substrates treated with the block copolymer composition.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.