Electron beam manipulation system and method in X-ray sources
US8712015B2 · kind B2 · utility
9Cited by
8References
25Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Aug 31, 2011 |
| Grant date | Apr 29, 2014 |
| Priority date | — |
| Expiry date | Oct 10, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G1/52
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
The embodiments disclosed herein relate to the controlled generation of X-rays and, more specifically, to the control of electron beams that are used to produce X-rays using one or more electron beam manipulation coils. For example, methods and devices for driving an electron beam manipulation coil, as well as systems using these devices, are provided. The systems are generally configured to maintain a first current though an electron beam manipulation coil using a first voltage source and to switch the first current to a second current using a second voltage source.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.