Metal-insulator-metal capacitors
US8716778B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 17, 2008 |
| Grant date | May 6, 2014 |
| Priority date | — |
| Expiry date | May 9, 2030 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L2924/0002
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Metal-insulator-metal capacitors are provided that are formed in integrated circuit dielectric stacks. A line-plate-line capacitor is provided that alternates layers that contain metal plates with layers that contain straight or angled parallel lines of alternating polarity. A segmented-plate capacitor is provided that has metal plates that alternate in polarity both within a layer and between layers. The line-plate-line and segmented-plate capacitors may exhibit a reduced parasitic inductive coupling. The capacitances of the line-plate-line capacitor and the metal-insulator-metal capacitor may have an enhanced contribution from an interlayer capacitance component with a vertical electric field than a horizontal intralayer capacitance component with a horizontal electric field.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.