Patent · US Active

Apparatus and method for crystallization of silicon

US8721789B2 · kind B2 · utility

1Cited by
3References
25Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMar 15, 2012
Grant dateMay 13, 2014
Priority date
Expiry dateMar 15, 2032

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T117/1008
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An apparatus for crystallization of silicon includes a crucible for containing silicon, a heating and heat dissipating arrangement provided for melting the silicon contained in the crucible and for subsequently solidifying the molten silicon, and an electromagnetic stirring device provided for stirring the molten silicon in the crucible during the solidification of the molten silicon. A control arrangement is provided for controlling the heating and heat dissipating arrangement to solidify the molten silicon at a specified solidification rate and for controlling the electromagnetic stirring device to stir the molten silicon in response to the specified solidification rate of the molten silicon such that the ratio of a speed of the molten silicon and the specified solidification rate is above a first threshold value.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.