Gas injection device with uniform gas velocity
US8721835B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Mar 25, 2011 |
| Grant date | May 13, 2014 |
| Priority date | — |
| Expiry date | May 2, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T137/2224
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Embodiments of the device relate to an injector (11) for injecting a gas in a processing chamber, including an inlet (21) for receiving a gas wave or a gas flow, a flow-shaping section (20) for expanding the gas in a direction (YY′) perpendicular to a propagation axis (XX′) of the gas, and an outlet (22) for expelling the gas. The flow-shaping section has first and second sidewalls (23) which diverge according to a divergence angle (A1) relative to the propagation axis of the gas, and includes means for slowing down the velocity of the gas near the center of the flow-shaping section, relative to the velocity of the gas near at least one sidewall.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.