Patent · US Active

Resin for thermal imprint

US8721950B2 · kind B2 · utility

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8Claims
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Key dates

Filing dateNov 1, 2012
Grant dateMay 13, 2014
Priority date
Expiry dateNov 1, 2032

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH05K2203/0108
  • WIPO fieldMacromolecular chemistry, polymers
  • WIPO sectorChemistry

Abstract

A resin for thermal imprint include a cyclic-olefin-based thermoplastic resin that contains at least one of skeletons represented by the following chemical equation 1 or the following chemical equation 2 in a main chain. The glass transition temperature Tg (° C.) and the value ([M]) of MFR at 260° C. satisfy the following equation 1, and [M]>10. The thermal imprint characteristics (transferability, mold release characteristic, and the like) are superior and the productivity (throughput) is improved.Tg(° C.)<219×log [M]−104  [Equation 1]

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.