Apparatus and method for supplying hydrogen gas, and quartz glass manufacturing apparatus
US8726693B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Feb 16, 2010 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | Sep 5, 2031 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC03B37/01413
- WIPO fieldOther special machines
- WIPO sectorMechanical engineering
Abstract
There is provided an apparatus for supplying a hydrogen gas to a quartz glass manufacturing apparatus including a burner that generates an oxyhydrogen flame when supplied with the hydrogen gas, where the apparatus includes: a first hydrogen supply system that supplies a hydrogen gas in which isomers are in equilibrium; a second hydrogen supply system that supplies a hydrogen gas in which isomers are out of equilibrium; a flow rate control section that includes: a valve that changes a flow rate of the hydrogen gas to be supplied to the burner; a first flow rate measuring section that measures the flow rate of the hydrogen gas to be supplied to the burner by measuring a heat capacity; and a control section that controls the valve in such a manner that a measured value obtained by the first flow rate measuring section approaches a set value input from outside; a second flow rate measuring section that measures the flow rate of the hydrogen gas to be supplied to the burner by measuring a different factor than the heat capacity; and a set value compensating section that compensates the set value by multiplying the set value by a ratio between the measured value obtained by the first flo…
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.