Processing of monolayer materials via interfacial reactions
US8728433B2 · kind B2 · utility
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Key dates
| Filing date | May 10, 2012 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | May 22, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC01B2204/22
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
A method of forming and processing of graphene is disclosed based on exposure and selective intercalation of the partially graphene-covered metal substrate with atomic or molecular intercalation species such as oxygen (O2) and nitrogen oxide (NO2). The process of intercalation lifts the strong metal-carbon coupling and restores the characteristic Dirac behavior of isolated monolayer graphene. The interface of graphene with metals or metal-decorated substrates also provides for controlled chemical reactions based on novel functionality of the confined space between a metal surface and a graphene sheet.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.