Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
US8728588B2 · kind B2 · utility
1Cited by
7References
10Claims
0Family size
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Key dates
| Filing date | Oct 9, 2008 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | Apr 22, 2029 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32733
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.