Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate
US8728715B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 13, 2012 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | Mar 21, 2032 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB01L3/502707
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A method of forming a patterned photoresist layer having a hydrophobic surface is provided. The method includes forming a photoresist layer on a substrate and image patterning. The photoresist layer may comprise a polymeric material. The imaged photoresist layer may then undergo a two-stage post-exposure bake. A surface treatment may be performed on the photoresist layer in between the two-stage post-exposure bake. The surface treatment may include applying a siloxane solution on a partially post-exposure baked photoresist layer. The post-exposure baked photoresist layer may then be developed to form the patterned photoresist layer. The method may be used to form a hydrophobic photoimageable nozzle plate of a micro-fluid ejection head having improved mechanical properties and stable hydrophobic properties.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.