Arbitrary pattern direct nanostructure fabrication methods and system
US8728720B2 · kind B2 · utility
2Cited by
8References
21Claims
0Family size
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Key dates
| Filing date | Jun 8, 2011 |
| Grant date | May 20, 2014 |
| Priority date | — |
| Expiry date | Mar 20, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/50
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
Methods of producing a nanostructure in a target film are provided. The method includes selectively irradiating at least one focusing element of a near-field focusing array that is in near-field focusing relationship with a target film in a manner sufficient to produce a nanostructure from the target film. Also provided are systems for practicing methods of the invention, as well as objects produced thereby.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.