Carbonyl propyl sulfuryl anthrapyridone sulfonic acid compounds and their preparation methods and applications
US8734580B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Jun 17, 2013 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Jun 17, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D7/41
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The present invention relates to compounds shown in the general formula (I) or (III), the salts thereof or their mixtures, as well as their preparation method and application. In the general formula (I), X1 is H or CO2H; X2 is OH or phenyl group with 0-2 sulfonic acid substituents, and the sulfonic acid substituents are located at random positions of a benzene ring; when X2 is OH, X1 is H; when X2 is phenyl group with 0-2 sulfonic acid substituents, X1 is H or CO2H; n is an integer of 0-2; and in the general formula (III), n and m are respectively an integer of 0-2. The compounds and the mixtures not only have improved light resistance, ozone resistance and water resistance, but also have excellent water solubility and long-term stability in ink-jet ink.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.