Method of sensing local sputtering target selenization
US8734619B1 · kind B1 · utility
5Cited by
6References
23Claims
0Family size
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Inventor
Key dates
| Filing date | Mar 2, 2011 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Mar 9, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/12722
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method including directing a first radiation at a first copper-indium-gallium (CIG) sputtering target in a reactive copper indium gallium selenide (CIGS) sputtering process, detecting a first reflected radiation from the first CIG target and determining the amount of selenium poisoning of the first CIG target based on the first reflected radiation.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.