Surface etched diamond particles and method for etching the surface of diamond particles
US8734753B2 · kind B2 · utility
0Cited by
5References
14Claims
0Family size
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Key dates
| Filing date | Dec 30, 2010 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Feb 6, 2032 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/2982
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A method is provided of etching a diamond particle including the step of heating the particle at a temperature of about 700° C. or greater in the presence of water vapor to form an etched particle. Also provided is an etched particle having a core and a surface. The core is formed of sp3 hybridized carbon atoms covalently bonded together, and the surface has substantially no chlorine atoms, oxygen atoms or oxygen species.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.