Formation method of coating
US8734913B2 · kind B2 · utility
1Cited by
1References
11Claims
0Family size
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Key dates
| Filing date | Aug 5, 2011 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Jan 17, 2032 |
Classification
- Technology area (CPC F)Mechanical Engineering; Lighting; Heating
- CPC primaryF16C2206/04
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A formation method of a coating that coats a coated body with the coating includes: generating cylindrical plasma in a vacuum deposition chamber as well as supplying material gas into the vacuum deposition chamber; applying pulse voltage to the coated body; and attaching a shield member that shields an uncoated member to an uncoated part where the coating of the coated body is not formed with separation spacing over a coated part where the coating is to be formed for preventing decrease of hardness of the coating in the coated part.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.