Patent · US Active

Responding to arc discharges

US8735767B2 · kind B2 · utility

1Cited by

46References

37Claims

0Family size

Assignee

TRUMPF HUETTINGER GMBH + CO. KG · DE

Inventors

Moritz Nitschke · Glückstadt, DE
Gerhard Zaehringer · Glückstadt, DE

Key dates

Filing date	Dec 14, 2007
Grant date	May 27, 2014
Priority date	—
Expiry date	Apr 10, 2032

Classification

Technology area (CPC H)Electricity
CPC primaryH01J2237/0206
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

For responding to an arc discharge in a plasma process (PP), a parameter of the plasma process is monitored to detect arc discharges occurring in the plasma. After detection of an arc discharge, a first countermeasure for the suppression of arc discharges is executed. After completion of the first countermeasure, a delay time period is allowed to elapse before the parameter is rechecked. In the event that after conclusion of the variable delay time period an arc discharge is detected, a second countermeasure for the suppression of arc discharges is executed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.