Plasma generation device with split-ring resonator and electrode extensions
US8736174B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 15, 2010 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Jun 24, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2441
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generation device includes: a substrate having a first surface and a second surface; a stripline resonant ring disposed on the first surface of the substrate, and defining a discharge gap; a pair of electrode extensions connected to the stripline resonant ring at the discharge gap; a ground plane disposed on the second surface of the substrate; a gas flow element configured to flow gas between at least one of: (1) the discharge gap, and (2) the pair of electrode extensions; and a structure disposed adjacent the substrate to form an enclosure that substantially encloses at least a region including the discharge gap and the electrode extensions, the enclosure being adapted to contain a plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.