Method of making pattern data, and medium for storing the program for making the pattern data
US8739075B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 17, 2009 |
| Grant date | May 27, 2014 |
| Priority date | — |
| Expiry date | Apr 24, 2031 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/68
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.