Patent · US Active

Method and system for computing fourier series coefficients for mask layouts using FFT

US8739081B2 · kind B2 · utility

0Cited by
6References
20Claims
0Family size

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Key dates

Filing dateFeb 12, 2013
Grant dateMay 27, 2014
Priority date
Expiry dateFeb 12, 2033

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG03F1/70
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

A method and system for computing Fourier coefficients for a Fourier representation of a mask transmission function for a lithography mask. The method includes: sampling a polygon of a mask pattern of the lithography mask to obtain an indicator function which defines the polygon, performing a Fourier Transform on the indicator function to obtain preliminary Fourier coefficients, and scaling the Fourier coefficients for the Fourier representation of the mask transmission function, where at least one of the steps is carried out using a computer device.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.