Non-vacuum method for fabrication of a photovoltaic absorber layer
US8748216B2 · kind B2 · utility
3Cited by
15References
9Claims
0Family size
Assignee
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Key dates
| Filing date | Aug 5, 2011 |
| Grant date | Jun 10, 2014 |
| Priority date | — |
| Expiry date | Sep 30, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/541
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
The present invention provides a non-vacuum method of depositing a photovoltaic absorber layer based on electrophoretic deposition of a mixture of nanoparticles with a controlled atomic ratio between the elements. The nanoparticles are first dispersed in a liquid medium to form a colloidal suspension and then electrophoretically deposited onto a substrate to form a thin film photovoltaic absorber layer. The absorber layer may be subjected to optional post-deposition treatments for photovoltaic absorption.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.