Patent · US Active

Annealed nanostructured thin film catalyst

US8748330B2 · kind B2 · utility

16Cited by
13References
20Claims
0Family size

Assignee

Inventors

Key dates

Filing dateApr 26, 2011
Grant dateJun 10, 2014
Priority date
Expiry dateJun 5, 2031

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY02E60/50
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

This disclosure provides methods of making an enhanced activity nanostructured thin film catalyst by radiation annealing, typically laser annealing, typically under inert atmosphere. Typically the inert gas has a residual oxygen level of 100 ppm. Typically the irradiation has an incident energy fluence of at least 30 mJ/mm2. In some embodiments, the radiation annealing is accomplished by laser annealing. In some embodiments, the nanostructured thin film catalyst is provided on a continuous web.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.