Annealed nanostructured thin film catalyst
US8748330B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 26, 2011 |
| Grant date | Jun 10, 2014 |
| Priority date | — |
| Expiry date | Jun 5, 2031 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E60/50
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
This disclosure provides methods of making an enhanced activity nanostructured thin film catalyst by radiation annealing, typically laser annealing, typically under inert atmosphere. Typically the inert gas has a residual oxygen level of 100 ppm. Typically the irradiation has an incident energy fluence of at least 30 mJ/mm2. In some embodiments, the radiation annealing is accomplished by laser annealing. In some embodiments, the nanostructured thin film catalyst is provided on a continuous web.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.