Removal of silicon from brine

US8753519B2 · kind B2 · utility

Assignee

• UHDE GMBH · DE

Inventors

• Werner Pohl · Neubulach, DE
• Christoph Stegemann · Unna, DE
• Thomas Steinmetz · Dortmund, DE
• Sami Petteri Pelkonen · Dortmund, DE

Key dates

• Filing date: Dec 23, 2008
• Grant date: Jun 17, 2014
• Expiry date: Aug 19, 2031

Classification

• Technology area (CPC C): Chemistry; Metallurgy
• CPC primary: C25B15/08
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

A process for removing silicon compounds from aqueous NaCl brine includes, first, adjusting a weak brine to a pH value of less than 3 with hydrochloric acid. Iron(III) chloride or other trivalent iron ions are added to the acidified weak brine, the obtained weak brine is then continuously fed to a stirred dissolution vessel which contains undissolved salt in addition to brine. Fresh salt is charged batch-wise and intermittently to the dissolution vessel to produce strong brine. The obtained strong brine is fed to a stirred buffer vessel, the pH value in this buffer vessel being maintained at a level ranging from 5 to 8. A strong-brine flow is continuously withdrawn from the buffer vessel and filtered, and the filtrate containing the added iron and silicon is discharged. Also a system for carrying out this process is disclosed.