Substrate treatment system
US8757364B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jul 12, 2011 |
| Grant date | Jun 24, 2014 |
| Priority date | — |
| Expiry date | Jul 12, 2032 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC23C14/562
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A substrate treatment system for treating substrates in a continuous process includes a system chamber delimited by chamber walls, having an entry lock and an exit lock, and also at least one substrate treatment device and a transportation device inside the system chamber. The transportation device has an arrangement of transportation rollers arranged one behind the other in the transportation direction, for vertical or horizontal transportation of substrates. The rotor of the drive device is arranged under the pressure conditions prevailing in the system chamber and the stator of the drive device is arranged outside the pressure conditions prevailing in the system chamber.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.