Photoresist-free micropatterning on polymer surfaces

US8758974B2 · kind B2 · utility

Assignee

• BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE · US

Inventors

• Steven A. Soper · Baton Rouge, US
• Robin L. McCarley · Prairieville, US
• Bikas Vaidya · College Station, US

Key dates

• Filing date: Dec 12, 2003
• Grant date: Jun 24, 2014
• Expiry date: Jan 4, 2028

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/039
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A method is described for the direct photochemical modification and micro-patterning of polymer surfaces, without the need to use a photoresist. For example, micropatterns of various functional chemical groups, biomolecules, and metal films have been deposited on poly(carbonate) and poly(methyl methacrylate) surfaces. These patterns may be used, for example, in integrated electronics, capture elements, or sensing elements in micro-fluidic channels.