Patent · US Active

Photoresist composition

US8758979B2 · kind B2 · utility

3Cited by
2References
22Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 18, 2010
Grant dateJun 24, 2014
Priority date—
Expiry dateApr 12, 2031

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC01B32/156
  • WIPO fieldMicro-structural and nano-technology
  • WIPO sectorChemistry

Abstract

Methanofullerene derivatives having side chains with acid-labile protecting groups. The methanofullerene derivatives may find application as photoresist materials, and particularly as positive-tone photoresists.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.