Method of fabricating patterned functional substrates

US8765359B2 · kind B2 · utility

Assignee

• Complete Genomics, Inc. · US

Inventors

• Andres Fernandez · San Francisco, US
• Shaunak Roy · Palo Alto, US
• Jay Shafto · Mountain View, US
• Norman Lee Burns · Sunnyvale, US
• Claudia Richter · Sunnyvale, US
• Pierre Indermuhle · Berkeley, US

Key dates

• Filing date: Jun 5, 2012
• Grant date: Jul 1, 2014
• Expiry date: Jun 5, 2032

Classification

• Technology area (CPC B): Performing Operations; Transporting
• CPC primary: B05D1/60
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Methods of preparing organosilane-functionalized regions on a substrate surface and more specifically fabricating patterned functionalized substrates suitable to be optically read, the methods generally comprising employing a vapor deposition process of an organosilane gas onto a lithographically patterned silicon surface followed by removal of the patterning media in a bath of organic solvents and ultrasonic excitation. The inventive methods provide optimized surface density of functional species while avoiding deleterious effects that can occur when lithographically patterned substrates are exposed to various gaseous species during the functionalization process.