Plasmonic in-cell polarizer
US8767282B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 26, 2012 |
| Grant date | Jul 1, 2014 |
| Priority date | — |
| Expiry date | Sep 5, 2032 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F2203/10
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A plasmonic polarizer and a method for fabricating the plasmonic polarizer are provided. The method deposits alternating layers of non-metallic film and metal, forming a stack. A hard mask is formed overlying the stack. The hard mask comprises structures having dimensions and periods between adjacent structures less than a first length, where the first length is equal to (a first wavelength of light/2). The stack is etched through openings in the hard mask to form pillar stacks of alternating non-metallic and metal layers having the dimensions of the hard mask structures. Then, the hard mask structures are removed. In one aspect, subsequent to removing the hard mask structures, the spaces between the pillar stacks are filled with a dielectric material.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.