Arrangement for increasing the stress resistance of implants and one such implant
US8771361B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Sep 24, 2008 |
| Grant date | Jul 8, 2014 |
| Priority date | — |
| Expiry date | Nov 3, 2029 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61L27/227
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
An arrangement and an implant are provided for increasing the stress resistance of the implant arranged in an upper jaw bone. The implant has access via parts to the sinus cavity. At said parts, the implant is arranged with a convex or rounded front surface which, upon access, lifts the sinus mucous membrane, without piercing the latter, and thus forms a closed space between the parts and the underside of the mucous membrane. The implant is provided, at least at said parts, with growth-stimulating substance or substances which interact with cell-containing body fluid which penetrates or has penetrated into the space, so that new bone is formed around said parts of the implant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.