Organoaminosilane precursors and methods for making and using same
US8771807B2 · kind B2 · utility
431Cited by
44References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | May 17, 2012 |
| Grant date | Jul 8, 2014 |
| Priority date | — |
| Expiry date | May 17, 2032 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/0228
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Described herein are organoaminosilane precursors which can be used to deposit silicon containing films which contain silicon and methods for making these precursors. Also disclosed herein are deposition methods for making silicon-containing films or silicon containing films using the organoaminosilane precursors described herein. Also disclosed herein are the vessels that comprise the organoaminosilane precursors or a composition thereof that can be used, for example, to deliver the precursor to a reactor in order to deposit a silicon-containing film.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.